TEM Grids with Support Film

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure formvar resin. The thickness range is as follows:

• Standard: Approx. 10nm
• Ultra-Thin (UL): 5-6nm
• Thick (TH): 15-20nm
• Extra Thick (ET): 25-50nm

A thin film of pure formvar resin. The thickness range is as follows:

• Standard: Approx. 10nm
• Ultra-Thin (UL): 5-6nm
• Thick (TH): 15-20nm
• Extra Thick (ET): 25-50nm

A thin film of pure formvar resin. The thickness range is as follows:

• Standard: Approx. 10nm
• Ultra-Thin (UL): 5-6nm
• Thick (TH): 15-20nm
• Extra Thick (ET): 25-50nm

A formvar coated TEM grid, stabilized with evaporated carbon film. This type of coating is excellent for specimen support, especially for ultra thin sections. The thickness ranges from 5-50nm formvar and 1-30nm carbon. For detailed information see description.

A formvar coated TEM grid, stabilized with evaporated carbon film. This type of coating is excellent for specimen support, especially for ultra thin sections. The thickness ranges from 5-50nm formvar and 1-30nm carbon. For detailed information see description.

A formvar coated TEM grid, stabilized with evaporated carbon film. This type of coating is excellent for specimen support, especially for ultra thin sections. The thickness ranges from 5-50nm formvar and 1-30nm carbon. For detailed information see description.

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

Graphene is a single atomic layer of carbon atoms tightly packed in a two-dimensional honeycomb lattice. Graphene is the ideal support film for electron microscopy.

Please note: Graphene grids films have a shelf-life of 45 days only! The graphen film covers only small parts of the open area of the grid.

A thin film of pure formvar resin. The thickness range is as follows:

• Standard: Approx. 10nm
• Ultra-Thin (UL): 5-6nm
• Thick (TH): 15-20nm
• Extra Thick (ET): 25-50nm

A formvar coated TEM grid, stabilized with evaporated carbon film. This type of coating is excellent for specimen support, especially for ultra thin sections. The thickness ranges from 5-50nm formvar and 1-30nm carbon. For detailed information see description.

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A formvar film stabilized with a thin film of Silicon monoxide. Silicon monoxide produces a desirable support film because it offers low background contrast and it is stable under the electron beam and it is more hydrophilic than carbon film.

A formvar film stabilized with a thin film of Silicon monoxide. Silicon monoxide produces a desirable support film because it offers low background contrast and it is stable under the electron beam and it is more hydrophilic than carbon film.

A thin film of pure silicon monoxide (15 - 30 nm) is deposited directly on top of the grid.

A thin film of pure silicon monoxide (15 - 30 nm) is deposited directly on top of the grid.