Size Standards

The Checkerboard Calibration Standard is a precise instrument for magnification and image calibration of Scanning Electron Microscopes (SEM). It features a complex checkerboard pattern with feature sizes ranging from 1µm to 5mm, fabricated using 60nm thick chromium on a conductive silicon substrate. The standard is suitable for magnifications from 20x to 50,000x with an accuracy of ±0.1% and is NIST traceable. It is designed for both calibration and image distortion checks and is available in various mounting options.

The MAG*I*CAL performs all major TEM calibrations: All TEM magnification ranges, Camera constant, Image Diffraction Pattern Rotation, Directly traceable to a natural constant. Magnification range from 1,000x to 1,000,000x.

Since crystal lattice plane spacings are accurately known from x-ray measurements, they provide a good test of microscope stability and a calibration of magnification in the upper range of magnification of the instrument.

Since crystal lattice plane spacings are accurately known from x-ray measurements, they provide a good test of microscope stability and a calibration of magnification in the upper range of magnification of the instrument.

Since crystal lattice plane spacings are accurately known from x-ray measurements, they provide a good test of microscope stability and a calibration of magnification in the upper range of magnification of the instrument.

Evaporated Pt/Ir on Holey carbon film. Holey carbon film support provides holes for ease of focus and astigmatism correction. The dots of evaporated Pt/Ir provide dense particles for resolution checks through the particle seperation test.

These fine mesh grids are suitable for the low magnification range of a TEM.

These fine mesh grids are suitable for the low magnification range of a TEM. Available as a sandwich in a folding 3.05mm mesh grid.

This Test Specimen is made of a 5x5mm square of single crystal silicon. It is photo-etched and the squares repeat every 10µm. The dividing lines are 1.9µm wide. A broader etching line is written every 500µm, which is useful in light microscopy.