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TEM Grids, Graphene Oxide on Silicon Nitride with 2.5µm holes, various Layers, Si
Graphene Oxide film of various thickness, supported by a Silicon Nitride film on a 3mm hexagonal Silicon substrate with 0.5x0.5mm sized aperture. The TEM Grids are available with graphene oxide film of 1 or 2 layers. Ideal for nanoparticle analyses.
Product Details
Description
Thin mono layers of graphene oxide are created by oxidizing graphene layer using a proprietary oxidation process.
Characteristics
- Two thicknesses of graphene oxide available: 1 or 2 layers
- Substrate is a 200nm thin silicon nitride film with approx. 6400 2.5µm sized holes on a 200µm thick 3.0mm hexagonal silicon substrate with 0.5x0.5mm aperture
- Graphene oxide coverage about 70%
- Graphene Oxide film is hydrophilic and therefore more suitable for life science applications
Specifications
| Type | Graphene Oxide Thickness* | Substrate | Support Film |
| 1 Layer | 0.8-1.2nm | Silicon, AP 0.5x0.5mm | Silicon Nitride 2.5µm holes |
| 2 Layer | 1 - 1.5nm | Silicon, AP 0.5x0.5mm | Silicon Nitride 2.5µm holes |
*Measured by EELS
More Information
| Coating |
Graphene Oxide
|
|---|---|
| Film Thickness | 0,8 - 1,5nm |
| Material |
Silicon Nitride
|
| Material Symbol | Si |
| Mesh Style |
single Hole
|
| Manufacturer |
EMS
|
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