Microporous Silicon Nitride Film TEM Window Grids
Microporous SiN TEM Windows offer a range of different pore sizes (2-10 μm) on a square silicon nitride membrane. This enables observation in the TEM without background noise. SiN film thicknesses of 20, 30, 50 or 200nm available.
Product Details
Description
Features
- Plasma Cleanable - can be vigorously plasma cleaned to remove organic contamination
- High Temperature Tolerance - resist temperatures up to and above 1000°C
- Mechanical Robustness - withstand harsh conditions
- Flat, insulating and hydrophobic - incorporates LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride
- Chemically Inert - resistant to bases, acids (except HF) and solvents
- High Beam Current Tolerant
- Carbon-Free and Ultra-Clean
- Good X-ray transmission performance
- Compatible - fit standard 3mm TEM grid holders, octagonal shape
Uses:
- Environmental TEM (dynamic processes at high temperatures)
- Nanoparticle imaging
- Analysis of nano materials, semiconductor materials, optic-crystal materials, functional film materials etc.
- (Quantitative) Carbon Analysis (photoresist, polymers, food, oil, fuel etc.)
- Crystal growth research
- X-Ray microscopy and X-Ray spectroscopy techniques
- Thin film research
- In-situ characterization of chemical reactions and annealing effects
- Biological sample observation thanks to superior biocompatibility: on-film growth of cells or other biological samples
- Characterization experiments of colloids, aerogels, organic materials and nanoparticles
Recommended Use
SiN film thickness | Product examples and window sizes | |
Highest Resolution Imaging |
5nm | E76042-43, 1 square (0,025mm) E76042-44, 8 squares (0,05mm), 1 slot (0,05x0,1mm) E76042-45, 2 slots (0,05x1,5mm)* |
High Resolution | 10nm | E76042-46, 8 squares (0,1mm), 1 slot (0,1x0,35mm) E76042-47, 8 squares (0,25mm), 1 slot (0,25x0,5mm) YSG010Z, 1 square (0,1mm) YSG015Z, 1 square (0,15mm) YSG025Z, 1 square (0,25mm) YSG050Z, 1 square (0,5mm) YSAR010Z, 9 squares (0,1mm) |
Everyday Imaging | 20nm | YSG001AT, 1 square (0,01mm) E76042-48, 8 squares (0,1mm), 1 slot (0,1x0,35mm) E76042-49, 1 square (0,5mm) E76042-50, 9 squares (0,1mm) |
Demanding Conditions | 50nm | E76042-53, 1 square (0,1mm) E76042-52, 1 square (0,5mm) E76042-51, 1 square (1mm) YSTA015C, 2 slots (0,1x1,5mm) E76042-50, 9 squares (0,1mm) |
Suspension Materials & Cryo-TEM | Microporös, nanoporös | E76042-41, 1 square (0,5mm) E76042-40, 1 square (0,5mm) YSME050B, 1 square (0,5mm), 2,8μm holes YSME050C, 1 square (0,5mm), 2,0μm holes YSME050C10, 1 square (0,5mm), 10μm holes YSME050E05, 1 square (0,5mm), 5μm holes YSNP-TE025B, 1 square (0,25mm), 20-200nm holes, 50nm SiN YSNP-TE010D, 1 square (0,1mm), 20-200nm holes, 200nm SiN |
*Coated with 1nm ultrahigh purity carbon to minimize charging
More Information
Film Type |
Mikroporous SiN film
|
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Material |
Silicon Nitride
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